CMI has developed and designed unique laboratory electroplating equipment for:
- Batch deposition of metal oxide coatings such as ZnO, Al2O3, In2O3, CdO, Y2O3, WO3, ZrO2, and SnO2 on Si –cells, wafers and other substrates with bulk conductivity
- In-line deposition of metal oxide coatings such as ZnO, Al2O3, In2O3, CdO, Y2O3, WO3, ZrO2, and SnO2 on substrates with surface electrical conductivity (n– or p+ type silicon wafers, metals such as nickel, silver, copper etc. as well as dielectric substrates with conductive surface coatings such as ITO glass, FTO glass or metal coated glass or polymer, PET ITO and other polymers with conductive surface etc).
- Batch anodic oxidation of Si-substrate to grow Silicon Oxide coatings