About Us

chemical-diagram-on-blueburstClear Metals Inc. (“CMI”) was formed in 2012 with a goal of realizing the full potential of this revolutionary metal oxide deposition technology. Originally developed for photovoltaic (“PV”) market applications, our proprietary approach to metal oxide deposition offers a number of unique advantages, including being a direct replacement of the magnetron sputtering process typically used in the following applications:

Antireflective coatings for high efficiency Photovoltaic cells


CMI’s patented technology for ZnOZnO Zinc oxide is an inorganic compound with the formula ZnO.
ZnO is a white powder that is insoluble in water, which is widely used as an additive in numerous materials and products including plastics, ceramics, glass, cement, lubricants, paints, ointments, adhesives, sealants, pigments, foods (source of Zn nutrient), batteries, ferrites, fire retardants, and first aid tapes. It occurs naturally as the mineral zincite but most zinc oxide is produced synthetically. This semiconductor has several favorable properties, including good transparency, high electron mobility, wide bandgap, and strong room-temperature luminescence. Those properties are used in emerging applications for transparent electrodes in liquid crystal displays, in energy-saving or heat-protecting windows, and in electronics as thin-film transistors and light-emitting diodes.
– from Zinc Oxide, Wikipedia
antireflective coating does replace conventional plasma enhanced chemical vapour deposition (“PECVD”) approach and offers the following advantages to high efficiency PV cell manufacturers:

  • CMI’s Vacuum free process will have lower  equipment outlays as well as lower ongoing maintenance and operating costs.
  • No substrate damage occurs during the deposition process (PECVD ion cleaning pre-treatment can cause a substrate damage).
  • As high as a 10-fold increase in deposition rates.
  • It is a low temperature process operating at 20oC – 40oC versus 400oC – 600oC of a typical PECVD process.
  • The post deposition annealing process is also at a lower temperature than a typical PECVD annealing procedure (200oC vs 600oC).
  • High accuracy control of deposition layer thickness (±2nm in the 50-200nm thickness range).
  • ~95% to 98% chemical utilization that is up to 3-times relative to that of a typical PECVD process.
  • Low energy consumption process (as much as 500x less than PECVD).
  • Applicable to next generation super thin Si-wafers and hetero-junction solar cells.

 

Passivation coatings for high efficiency Photovoltaic cells


Our development work in this area has demonstrated general feasibility of direct deposition of Al2O3 passivation antireflective coating on crystalline silicon solar cells using CMI’s proprietary deposition equipment and process. Al2O3 passivation coatings for Si-single crystal and multi-crystalline solar cells were evaluated by minority carrier life time measurements and demonstrated passivation characteristics similar to those of PECVD deposited SiNx coatings while offering an up to 90% estimated reduction in overall manufacturing cost compared to PECVD.

 

Transparent Conductive Oxide coatings for thin-film Photovoltaic module


CMI’s patented approach to deposition of Transparent Conductive Oxide (TCO) coatings can offer the following potential benefits when applied in manufacturing of thin-film Photovoltaic modules:

  • CMI’s vacuum free process will have lower equipment outlays as well as ongoing lower maintenance and operating costs.
  • High material utilization typical of CMI’s deposition process enables lower product manufacturing costs.
  • High conductivity of CMI TCO coatings offers a possibility of increased active area of thin-film photovoltaic modules due to lower amount of required scribing. This in turn offers a possibility of increased photovoltaic module efficiency.
  • High transparency of CMI TCO coating offers a possibility of maintaining or increasing the photovoltaic module’s efficiency while at the same time obtaining efficiency benefits of highly conductive TCO coating.

 

Transparent Conductive Oxide coatings for LCD / Flat Panel displays


CMI’s patented approach to deposition of Transparent Conductive Oxide (TCO) coatings can offer the following potential benefits when applied in manufacturing of thin-film Photovoltaic modules:

  • CMI’s vacuum free process will have lower equipment outlays as well as lower ongoing maintenance and operating costs.
  • High material utilization typical for CMI’s deposition process enables lower product manufacturing costs. Typical material utilization during the CMI TCO deposition process is in excess of 95%.
  • CMI’s TCO deposition process offers a possibility of producing TCO coatings that are both highly conductive and transparent. This unique feature potentially assists LCD display manufacturers to:
    • Achieve greater resolution on larger display size;
    • Reduce energy consumption of the LCD flat panel display.
  • CMI’s TCO deposition process takes place at low temperatures. As a result, CMI’s technology potentially enables the use of temperature sensitive but light weight and in some cases flexible materials in LCD Flat panel display manufacturing that are not otherwise possible with conventional approach to TCO deposition.

 

Transparent Conductive Oxide coatings for smart-phone and tablet displays

  • CMI’s vacuum free process will have lower equipment outlays as well as lower ongoing maintenance and operating costs.
  • High material utilization typical for CMI’s deposition process enables lower product manufacturing costs. Typical material utilization during the CMI TCO deposition process is in excess of 95%.
  • CMI’s TCO deposition process offers a possibility of producing TCO coatings that are both highly conductive and transparent. This unique feature can assists smart phone and tablet computer display manufacturers to:
    • Achieve greater resolution with smaller individual pixel size;
    • Reduce energy consumption of the smart-phone and tablet computer screens;
    • CMI’s TCO deposition process takes place at low temperatures. As a result, CMI’s technology potentially enables the use of temperature sensitive but light weight and in some cases flexible materials in smart-phone and tablet computer screen manufacturing that are not otherwise possible with conventional approach to TCO deposition.

 

Transparent Transistor structures for transparent and flexible electronics applications

  • CMI’s proprietary manufacturing process can substantially reduce the cost and thus act as one of the catalysts in industry’s transition from silicon based transistor structure to transparent ZnO based transistor design.
  • CMI’s vacuum free process will have lower equipment costs as well as lower ongoing maintenance and operating costs.
  • High material utilization typical for CMI’s deposition process enables lower product manufacturing costs. Typical material utilization during the CMI TCO deposition process is in excess of 95%.
  • CMI’s TCO deposition process offers a possibility of producing TCO coatings that are both highly conductive and transparent. This unique feature can assists transparent electronics manufacturers to:
    • Achieve greater resolution with smaller individual pixel size;
    • Reduce energy consumption of the smart-phone and tablet computer screens;
    • CMI’s TCO deposition process takes place at low temperatures. As a result, CMI’s technology potentially enables the use of temperature sensitive but light weight and in some cases flexible materials that are not otherwise possible with conventional approach to TCO deposition.


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